On Friday, Canon, renowned for its printers and cameras, released its new revolutionary tool: a nanoimprint lithography system that it claims can create the most cutting-edge semiconductors. By introducing this device, Canon has provided a challenge to ASML, the current leader in extreme ultraviolet (EUV) lithography systems. Canon's new machine, the FPA-1200NZ2C, is capable of producing semiconductors with as much as a 5 nanometer process, and has the potential to go as small as 2nm.
On Friday, Canon, renowned for its printers and cameras, unveiled a potentially game-changing tool that can be used to produce the most modern semiconductors. This "nanoimprint lithography" system is Canon's response to Dutch firm ASML, whose hardware is an integral part of the creation of top-of-the-line chips like those used in the latest iPhones from Taiwan's TSMC. As the ongoing race between the U.S. and China continues, ASML's EUV technology has become increasingly sought after for its capability to make semiconductors at 5 nanometers and below. The nanometer figure is an indicator of a chip's complexity, as a smaller figure translates to a higher capacity for features and, consequently, more powerful semiconductors.
Canon announced the launch of its FPA-1200NZ2C machine, which is able to create semiconductors of up to 5nm, and as small as 2nm. For comparison, the A17 Pro in Apple's iPhone 15 Pro and Pro Max is a 3nm semiconductor. Already, TSMC and Samsung, two of the largest chip production companies, have plans to make 2nm chips by 2025.
Lithography machines are vital for designing and printing chips onto the materials that form the semiconductor. ASML's machines use UV light for this purpose. Canon mentioned that their device does not need a special wavelength light source, which would in turn reduce power consumption.
As the world relies more and more on chips for technologies such as AI, Canon has begun to reinvigorate its focus on the semiconductor industry, drawing on their background in cameras, optics and printers. They have been experimenting with nanoimprint lithography (NIL) technology since 2004; however, as of yet, it has failed to be widely accepted. Pranay Kotasthane from the Takshashila Institution explained: "NIL has been there for more than 20 years, but hasn't found wide acceptance". Part of the reason is because EUV machines such as those from ASML have proved to be more effective for chip manufacturing.
Semiconductors are at the heart of the technological contest between the U.S. and China, since they are essential in many areas, from AI to military purposes. The U.S. has employed export controls and sanctions to cut off China's access to crucial chips and fabrication hardware, slowing the development of the second-largest economy in a field where it is already lagging. In particular, ASML has been forbidden by the Dutch government to export its EUV lithography machines to China; none have been supplied to the nation. These machines, which are needed to produce the most advanced chips, are the reason for the restriction. With Canon disclosing a new machine that can help fabricators create 2nm semiconductors, it is likely to come up against similar scrutiny; as of this writing, Canon has not responded to CNBC's request for a comment on the matter of shipping this machine to China. China has failed to give rise to top lithography machine companies that can assist its domestic industry in advancing semiconductor manufacture. Nevertheless, Huawei released a new smartphone last month with a 7nm chip, something that was thought to be impossible without an ASML EUV machine, raising questions in Washington and reviving the issue of export bans. Recently, Reuters reported that the U.S. had notified China of its plans to revise regulations concerning the shipment of semiconductor manufacturing equipment and AI chips.
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